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PLASMA-THERM LAPECVD
    Description
    No description
    Configuration
    Plasma Enhanced Chemical Vapor Deposition System -PM3 Voltage:208 VOLTS Frequency:50/60 HERTZ Phase:3 Current:63 AMPS Dimensions: Standard Overall: 83 x 46 x 89 IN - 1500 LBS
    OEM Model Description
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    Documents

    No documents

    PLASMA-THERM

    LAPECVD

    verified-listing-icon

    Verified

    CATEGORY
    PECVD

    Last Verified: Over 60 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    62674

    Wafer Sizes:

    Unknown

    Vintage:

    2009

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
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    Transaction Insured by Moov
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    Refurbishment Services
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    Similar Listings
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    PLASMA-THERM LAPECVD

    PLASMA-THERM

    LAPECVD

    PECVD
    Vintage: 2009Condition: Used
    Last VerifiedOver 60 days ago

    PLASMA-THERM

    LAPECVD

    verified-listing-icon
    Verified
    CATEGORY
    PECVD
    Last Verified: Over 60 days ago
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/03565e4565c04ae3bc771bfc463d71ea_499b92a1f4794b9295d6f0d0ad0e7a801201a_mw.jpeg
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    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    62674

    Wafer Sizes:

    Unknown

    Vintage:

    2009

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Plasma Enhanced Chemical Vapor Deposition System -PM3 Voltage:208 VOLTS Frequency:50/60 HERTZ Phase:3 Current:63 AMPS Dimensions: Standard Overall: 83 x 46 x 89 IN - 1500 LBS
    OEM Model Description
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    Documents

    No documents

    Similar Listings
    View All
    PLASMA-THERM LAPECVD

    PLASMA-THERM

    LAPECVD

    PECVDVintage: 2009Condition: UsedLast Verified: Over 60 days ago