LAM RESEARCH / NOVELLUS CONCEPT ONE "C1"

Description

No description

Configuration

Machine Type: PE-SiH4

OEM Model Description

The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.

Documents

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LAM RESEARCH / NOVELLUS

CONCEPT ONE "C1"

Verified

PECVD

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

126877

Wafer Sizes:

6"/150mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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