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LAM RESEARCH / NOVELLUS CONCEPT ONE "C1"
    Description
    De-installed No missing parts, with HDD
    Configuration
    Category- PE-CVD Process- SiH4 Base SiO2/SiN Model- C1-200
    OEM Model Description
    The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.
    Documents

    No documents

    LAM RESEARCH / NOVELLUS

    CONCEPT ONE "C1"

    verified-listing-icon

    Verified

    CATEGORY
    PECVD

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Deinstalled


    Product ID:

    110918


    Wafer Sizes:

    8"/200mm


    Vintage:

    2003


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    LAM RESEARCH / NOVELLUS CONCEPT ONE "C1"

    LAM RESEARCH / NOVELLUS

    CONCEPT ONE "C1"

    PECVD
    Vintage: 1995Condition: Used
    Last VerifiedOver 30 days ago

    LAM RESEARCH / NOVELLUS

    CONCEPT ONE "C1"

    verified-listing-icon
    Verified
    CATEGORY
    PECVD
    Last Verified: Over 60 days ago
    listing-photo-437ace016847485eaa143b2ec4060e39-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/41427/437ace016847485eaa143b2ec4060e39/4b31e4aa7c2f40218cccd4b7574e8c35_datasheetnvlsc1200sn7689apage1image0004_mw.jpg
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    listing-photo-437ace016847485eaa143b2ec4060e39-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/41427/437ace016847485eaa143b2ec4060e39/e059e30baf384193b7b9da47ecf4a4b6_datasheetnvlsc1200sn7689apage2image0005_mw.jpg
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    Key Item Details

    Condition:

    Used


    Operational Status:

    Deinstalled


    Product ID:

    110918


    Wafer Sizes:

    8"/200mm


    Vintage:

    2003


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    De-installed No missing parts, with HDD
    Configuration
    Category- PE-CVD Process- SiH4 Base SiO2/SiN Model- C1-200
    OEM Model Description
    The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.
    Documents

    No documents

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