
Description
pump 2Configuration
Process Gas:CDA/N2/Ar/ASH3/BF3OEM Model Description
The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.Documents
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SOPHI-200
CATEGORY
Medium Current
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
130326
Wafer Sizes:
6"/150mm
Vintage:
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
pump 2Configuration
Process Gas:CDA/N2/Ar/ASH3/BF3OEM Model Description
The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.Documents
No documents