Description

implanter

Configuration

Dosage range (actual dose: 10¹⁰～10¹⁴ ions/cm²), beam current (～500μA). * Throughput: ≥100 ions/h (6in)

OEM Model Description

The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.