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ULVAC SOPHI-200
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.
    Documents

    No documents

    ULVAC

    SOPHI-200

    verified-listing-icon

    Verified

    CATEGORY
    Medium Current

    Last Verified: Over 30 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    114782

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    ULVAC SOPHI-200

    ULVAC

    SOPHI-200

    Medium Current
    Vintage: 0Condition: Used
    Last VerifiedOver 30 days ago

    ULVAC

    SOPHI-200

    verified-listing-icon
    Verified
    CATEGORY
    Medium Current
    Last Verified: Over 30 days ago
    listing-photo-93e1133e29d04c498c6f065099ab8501-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    114782

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.
    Documents

    No documents

    Similar Listings
    View All
    ULVAC SOPHI-200

    ULVAC

    SOPHI-200

    Medium CurrentVintage: 0Condition: UsedLast Verified:Over 30 days ago