Description
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GSD 200XOEM Model Description
The Eaton/Axcelis GSD 200 is a high current implanter that can handle wafers up to 8 inches in size and has a maximum energy of 180KeV. It is part of the GSD platform, which is known for being the longest manufactured and supported batch ion implanter in the industry. Ion implantation, the technology used by this machine, involves bombarding ionized species into the first atomic layers of a solid to introduce different species into a substrate. This process can change the chemical or tribological properties of the surface, such as hardness, wear resistance, resistance to chemical attack, and reduced friction. It can also improve the oxidation resistance of coatings by forming a dense Al2O3 scale. This technology is widely used in micro-electronics, optics, bio-materials, and doped semiconductor materials.Documents
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AXCELIS
GSD 200
Verified
CATEGORY
High Current
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
79256
Wafer Sizes:
Unknown
Vintage:
2001
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Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
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Refurbishment Services
Available
AXCELIS
GSD 200
CATEGORY
High Current
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
79256
Wafer Sizes:
Unknown
Vintage:
2001
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
GSD 200XOEM Model Description
The Eaton/Axcelis GSD 200 is a high current implanter that can handle wafers up to 8 inches in size and has a maximum energy of 180KeV. It is part of the GSD platform, which is known for being the longest manufactured and supported batch ion implanter in the industry. Ion implantation, the technology used by this machine, involves bombarding ionized species into the first atomic layers of a solid to introduce different species into a substrate. This process can change the chemical or tribological properties of the surface, such as hardness, wear resistance, resistance to chemical attack, and reduced friction. It can also improve the oxidation resistance of coatings by forming a dense Al2O3 scale. This technology is widely used in micro-electronics, optics, bio-materials, and doped semiconductor materials.Documents
No documents