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6" Fab For Sale from Moov - Click Here to Learn More
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TEL / TOKYO ELECTRON TELFORMULA
    Description
    No description
    Configuration
    -300 mm Production with Max production 50 Pcs -2 IO Port ,12 Carrier Stock -Waves System CTL , Temp CTL M780 -Heater Type : VCM series , -Fork Transfer with 5+1 -2 Boat -Gas :N2, SiH4 ,1%PH3/He ,20%F2/N2, H2, O2
    OEM Model Description
    TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.
    Documents

    No documents

    TEL / TOKYO ELECTRON

    TELFORMULA

    verified-listing-icon

    Verified

    CATEGORY
    Furnaces / Diffusion

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    65731


    Wafer Sizes:

    12"/300mm


    Vintage:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / Diffusion
    Vintage: 2005Condition: Used
    Last VerifiedOver 60 days ago

    TEL / TOKYO ELECTRON

    TELFORMULA

    verified-listing-icon
    Verified
    CATEGORY
    Furnaces / Diffusion
    Last Verified: Over 60 days ago
    listing-photo-7d3a8d241da545958fe3f490214cc9be-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/51676/7d3a8d241da545958fe3f490214cc9be/d5f7baecb67941de9a1565c3ac6b9712_ef456d789f164b45a0eb2f1da3fac429_mw.png
    listing-photo-7d3a8d241da545958fe3f490214cc9be-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/51676/7d3a8d241da545958fe3f490214cc9be/c1a0996114c84a8081d7d345c10222fa_508f7b8a77434d5cb4f4ec04320575c51201a_mw.jpeg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    65731


    Wafer Sizes:

    12"/300mm


    Vintage:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    -300 mm Production with Max production 50 Pcs -2 IO Port ,12 Carrier Stock -Waves System CTL , Temp CTL M780 -Heater Type : VCM series , -Fork Transfer with 5+1 -2 Boat -Gas :N2, SiH4 ,1%PH3/He ,20%F2/N2, H2, O2
    OEM Model Description
    TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.
    Documents

    No documents

    Similar Listings
    View All
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / DiffusionVintage: 2005Condition: UsedLast Verified:Over 60 days ago
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / DiffusionVintage: 2007Condition: UsedLast Verified:Over 60 days ago
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / DiffusionVintage: 0Condition: UsedLast Verified:Over 30 days ago