Description
Miissing parts: Process Kits , Pyrometer Upper Wafer Size Range Minimum 200 mm Maximum 200 mm Set Size 200 mm Number of Chambers 2 Other Information Conversion June 2007 SPU to EPI System Exterior Dimensions Width 79.528 in (202.0 cm) Depth 81.496 in (207.0 cm) Height 95.669 in (243.0 cm) Weight 5,291 lb (2,400 kg)Configuration
No ConfigurationOEM Model Description
Applied Centura RP (reduced pressure) Epi systems.Documents
No documents
CATEGORY
Epitaxial deposition (EPI)
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
147415
Wafer Sizes:
8"/200mm
Vintage:
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA RP EPI
CATEGORY
Epitaxial deposition (EPI)
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
147415
Wafer Sizes:
8"/200mm
Vintage:
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Miissing parts: Process Kits , Pyrometer Upper Wafer Size Range Minimum 200 mm Maximum 200 mm Set Size 200 mm Number of Chambers 2 Other Information Conversion June 2007 SPU to EPI System Exterior Dimensions Width 79.528 in (202.0 cm) Depth 81.496 in (207.0 cm) Height 95.669 in (243.0 cm) Weight 5,291 lb (2,400 kg)Configuration
No ConfigurationOEM Model Description
Applied Centura RP (reduced pressure) Epi systems.Documents
No documents