Applied Centura RP (reduced pressure) Epi systems.


Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

APPLIED MATERIALS (AMAT)

CENTURA RP EPI

Miissing parts: Process Kits , Pyrometer Upper

Wafer Size Range	
Minimum	200 mm
Maximum	200 mm
Set Size	200 mm
Number of Chambers	2
Other Information	
Conversion June 2007 SPU to EPI System

Exterior Dimensions	
Width	79.528 in (202.0 cm)
Depth	81.496 in (207.0 cm)
Height	95.669 in (243.0 cm)
Weight	5,291 lb (2,400 kg)

CENTURA RP EPI

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APPLIED MATERIALS (AMAT)

CENTURA RP EPI

APPLIED MATERIALS (AMAT)

CENTURA RP EPI

APPLIED MATERIALS (AMAT)

CENTURA RP EPI

APPLIED MATERIALS (AMAT)

CENTURA RP EPI

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APPLIED MATERIALS (AMAT)

CENTURA RP EPI

APPLIED MATERIALS (AMAT)

CENTURA RP EPI