Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

In fiscal 2000, Applied introduced Epi xP™ Centura, that integrates pre- and post-epi processes on the system to reduce total epi production costs.

APPLIED MATERIALS (AMAT)

CENTURA EPI xP 

7800

CENTURA 4.0

AMC 7820

AMC 7810

CENTURA ACP RP

Applied Materials Centura Epi system is a production-proven, single-wafer, multi-chamber epitaxial silicon deposition product. Each radiantly-heated process chamber delivers precise and repeatable control of deposition conditions and 100% slip free films, excellent film thickness and resistivity uniformity, and low defect levels. The system’s wide range of temperatures and pressures, excellent temperature uniformity, and flexible gas panel configurations enable advanced low-temperature epitaxial and polycrystalline deposition processes, including germanium and silicon-germanium. In addition, the ability to configure up to three process chambers and hardware optimized for superior in-situ chamber cleaning deliver market-leading throughput density and low cost of ownership.

CENTURA ACP EPI

Applied Centura RP (reduced pressure) Epi systems.


CENTURA RP EPI

CENTURA ACP P3I

The AMAT 7600 epi reactor, introduced in 1975, was a much improved version of the earlier 7000 series system. It became the flagship of Applied Materials epi lines. The 7600 was a radiant hot wall system, meaning that it used lamps outside of the bell jar to supply the reaction energy. This gave it the economic advantage of containing many more wafers than could be held by competitive systems. The process provided several technical advantages as well. The 7600 became the standard bearer of the industry until single wafer, platform systems evolved.

7600

CENTURA ACP-SIGE

The Centura EPI is a state-of-the-art system that offers the advantages of single-wafer, multi-chamber design for epi deposition. This advanced system provides high throughput, lower cost of ownership benefits, and advanced robotics. The Centura EPI has recently undergone productivity enhancements, including the new AccuSETT remote system for accurate stepper enhanced thickness and In-Line Metrology for integrated FTIR in the cooldown chamber. These enhancements make the Centura EPI an even more powerful tool for epi deposition.

CENTURA EPI

AMC 7821

The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.

CENTURA  5200 HTF

The Precision 7700 Epi is a batch processing epitaxial reactor system that uses radiant-heating technology and automated wafer handling for superior defect control. It is available in both 200mm and 300mm versions, with the latter offering deposition for both Atmospheric and Reduced Pressure epi films, 100% slip-free results, and thickness uniformity under 1%. 

PRECISION 7700 EPI

CENTURA ACP

AMC 7811

The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

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Top APPLIED MATERIALS (AMAT) Epitaxial deposition (EPI)

7800

CENTURA 4.0

AMC 7820

CENTURA ACP RP

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All APPLIED MATERIALS (AMAT) Epitaxial deposition (EPI)