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APPLIED MATERIALS (AMAT) P5000 ETCH
    Description
    Metal Etch
    Configuration
    No Configuration
    OEM Model Description
    The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.
    Documents

    No documents

    APPLIED MATERIALS (AMAT)

    P5000 ETCH

    verified-listing-icon

    Verified

    CATEGORY
    Dry / Plasma Etch

    Last Verified: 5 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    118511


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    APPLIED MATERIALS (AMAT) P5000 ETCH

    APPLIED MATERIALS (AMAT)

    P5000 ETCH

    Dry / Plasma Etch
    Vintage: 1995Condition: Used
    Last VerifiedOver 60 days ago

    APPLIED MATERIALS (AMAT)

    P5000 ETCH

    verified-listing-icon
    Verified
    CATEGORY
    Dry / Plasma Etch
    Last Verified: 5 days ago
    listing-photo-7c5df89969a84ad8a03772103db9994e-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    118511


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Metal Etch
    Configuration
    No Configuration
    OEM Model Description
    The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.
    Documents

    No documents

    Similar Listings
    View All
    APPLIED MATERIALS (AMAT) P5000 ETCH

    APPLIED MATERIALS (AMAT)

    P5000 ETCH

    Dry / Plasma EtchVintage: 1995Condition: UsedLast Verified:Over 60 days ago
    APPLIED MATERIALS (AMAT) P5000 ETCH

    APPLIED MATERIALS (AMAT)

    P5000 ETCH

    Dry / Plasma EtchVintage: 1996Condition: UsedLast Verified:Over 60 days ago
    APPLIED MATERIALS (AMAT) P5000 ETCH

    APPLIED MATERIALS (AMAT)

    P5000 ETCH

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago