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TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
    Description
    No description
    Configuration
    4 chamber 3 load port
    OEM Model Description
    The Triase+™ EX-II™ TiN (Titanium Nitride) is an advanced 300mm single wafer deposition system for high speed ASFD which enables high-quality thin film formation with excellent within-wafer uniformity and high step coverage characteristics. Featuring an optimized reactor design with new gas injection module, the system achieves high productivity even in the leading-edge semiconductor device manufacturing, and is used for various applications including formation of contact barriers, capacitor electrodes, word line barriers and metal gates.
    Documents

    No documents

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    verified-listing-icon

    Verified

    CATEGORY
    Deposition

    Last Verified: 17 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    112221

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    TEL / TOKYO ELECTRON TRIASe+ EX-II TiN

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    Deposition
    Vintage: 0Condition: Used
    Last Verified17 days ago

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    verified-listing-icon
    Verified
    CATEGORY
    Deposition
    Last Verified: 17 days ago
    listing-photo-65763e3867cf44e08f6a89a592b08f76-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/65763e3867cf44e08f6a89a592b08f76/c636845d99d84ae2a9c5548724b93151_bb79d0e0177f4091af52bb27ef65970a1201a_mw.jpeg
    listing-photo-65763e3867cf44e08f6a89a592b08f76-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/65763e3867cf44e08f6a89a592b08f76/4e023ee997bf4ba4bb4464474feb1099_8a18551622474bcbbda13dabb2d59c281201a_mw.jpeg
    listing-photo-65763e3867cf44e08f6a89a592b08f76-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/65763e3867cf44e08f6a89a592b08f76/d4175b4089f348ccb72c3c00f2ededc7_8e9be37cc3ff45fbb6ed414771ba3a9a1201a_mw.jpeg
    listing-photo-65763e3867cf44e08f6a89a592b08f76-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/65763e3867cf44e08f6a89a592b08f76/833c00d86d5f456690890305c9d9acfe_9b7475e5b7bd4fde9e6d0bcfee50b8801201a_mw.jpeg
    listing-photo-65763e3867cf44e08f6a89a592b08f76-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/65763e3867cf44e08f6a89a592b08f76/d6a9a42e50634ff280317fe98644d98a_c3ab5bf6c9c340c783da73483a625389_mw.jpeg
    listing-photo-65763e3867cf44e08f6a89a592b08f76-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/65763e3867cf44e08f6a89a592b08f76/01e5257594f14ca3a6ed7e70bf08fc40_e67d1c86b41a4b7a8b95c7bbaa6954ee_mw.jpeg
    listing-photo-65763e3867cf44e08f6a89a592b08f76-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/65763e3867cf44e08f6a89a592b08f76/9b914c11255745a89d0d8c18eadbcf03_3a4f6ed9369e4e07aff18eec6f9456041201a_mw.jpeg
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    112221

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    4 chamber 3 load port
    OEM Model Description
    The Triase+™ EX-II™ TiN (Titanium Nitride) is an advanced 300mm single wafer deposition system for high speed ASFD which enables high-quality thin film formation with excellent within-wafer uniformity and high step coverage characteristics. Featuring an optimized reactor design with new gas injection module, the system achieves high productivity even in the leading-edge semiconductor device manufacturing, and is used for various applications including formation of contact barriers, capacitor electrodes, word line barriers and metal gates.
    Documents

    No documents

    Similar Listings
    View All
    TEL / TOKYO ELECTRON TRIASe+ EX-II TiN

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    DepositionVintage: 0Condition: UsedLast Verified:17 days ago