Description
No descriptionConfiguration
-P/N#: 27-156710-00 CONTROLLER,I/O,DUAL CAPACITY -P/N#: 02-125046-00 ASSY,HCM APVD ISIOC -P/N#: 02-145222-00 ASSY,ETCH ISIOC -P/N#:02-124499-00 ASSY,CASS FIELD CONN -P/N#: 02-121693-00 ASSY,PCA,TRANSER FIELD CONN -P/N#: 02-124482-00 ASSY,LOAD FIELD CONN,ISIOC -P/N#: 02-131736-00 ISIOC,HI-LO TRANSFER -P/N#: 02-131473-00 ASSY,ISIOC,LIQ COOLED PVD-PVD -P/N#: 02-124572-00 OBSOLETE, USE 02-131473-00 -P/N#: 02-145223-00 ASSY,BB-ETCH ISIOCOEM Model Description
The INOVA system, which is in the final stages of its development, is an advanced PVD system that delivers Maxfill aluminum and superior Ti/Ti-nitride film quality with excellent particle performance. Maxfill is an innovative, low-pressure, low-k compatible process for aluminum via fill. The Ti/TiN process is in production with Controlled Divergence Technology (CDS). The INOVA is a multi-chamber single wafer processing system. INOVA(TM) Tantalum films are designed to enable barriers for copper metallization.Documents
No documents
LAM RESEARCH / NOVELLUS
INOVA
Verified
CATEGORY
Deposition
Last Verified: Over 30 days ago
Key Item Details
Condition:
Parts Tool
Operational Status:
Unknown
Product ID:
114349
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
LAM RESEARCH / NOVELLUS
INOVA
CATEGORY
Deposition
Last Verified: Over 30 days ago
Key Item Details
Condition:
Parts Tool
Operational Status:
Unknown
Product ID:
114349
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
-P/N#: 27-156710-00 CONTROLLER,I/O,DUAL CAPACITY -P/N#: 02-125046-00 ASSY,HCM APVD ISIOC -P/N#: 02-145222-00 ASSY,ETCH ISIOC -P/N#:02-124499-00 ASSY,CASS FIELD CONN -P/N#: 02-121693-00 ASSY,PCA,TRANSER FIELD CONN -P/N#: 02-124482-00 ASSY,LOAD FIELD CONN,ISIOC -P/N#: 02-131736-00 ISIOC,HI-LO TRANSFER -P/N#: 02-131473-00 ASSY,ISIOC,LIQ COOLED PVD-PVD -P/N#: 02-124572-00 OBSOLETE, USE 02-131473-00 -P/N#: 02-145223-00 ASSY,BB-ETCH ISIOCOEM Model Description
The INOVA system, which is in the final stages of its development, is an advanced PVD system that delivers Maxfill aluminum and superior Ti/Ti-nitride film quality with excellent particle performance. Maxfill is an innovative, low-pressure, low-k compatible process for aluminum via fill. The Ti/TiN process is in production with Controlled Divergence Technology (CDS). The INOVA is a multi-chamber single wafer processing system. INOVA(TM) Tantalum films are designed to enable barriers for copper metallization.Documents
No documents