Description
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The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.Documents
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KLA
SPECTRAFX 200
Verified
CATEGORY
Defect Inspection
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
80168
Wafer Sizes:
12"/300mm
Vintage:
Unknown
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Logistics Support
Available
Money Back Guarantee
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Transaction Insured by Moov
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Refurbishment Services
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KLA
SPECTRAFX 200
Verified
CATEGORY
Defect Inspection
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
80168
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.Documents
No documents