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KLA SPECTRAFX 200
    Description
    Thickness measurement
    Configuration
    Film Thickness Measurement
    OEM Model Description
    The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.
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    KLA

    SPECTRAFX 200

    verified-listing-icon

    Verified

    CATEGORY

    Defect Inspection
    Last Verified: Over 60 days ago
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    55624

    Wafer Sizes:

    12"/300mm

    Vintage:

    2006

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    KLA SPECTRAFX 200
    KLASPECTRAFX 200Defect Inspection
    Vintage: 2006Condition: Used
    Last VerifiedOver 60 days ago

    KLA

    SPECTRAFX 200

    verified-listing-icon

    Verified

    CATEGORY

    Defect Inspection
    Last Verified: Over 60 days ago
    listing-photo-30937ef7046f4bc69b4976164e46e2b0-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/40827/30937ef7046f4bc69b4976164e46e2b0/7b433b4e96364058ba31e5857dd61373_f710c87ee2584532abfef22efd22c3961201a_mw.jpeg
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    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    55624

    Wafer Sizes:

    12"/300mm

    Vintage:

    2006

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Thickness measurement
    Configuration
    Film Thickness Measurement
    OEM Model Description
    The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.
    Documents

    No documents

    Similar Listings
    View All
    KLA SPECTRAFX 200
    KLA
    SPECTRAFX 200
    Defect InspectionVintage: 2006Condition: UsedLast Verified: Over 60 days ago
    KLA SPECTRAFX 200
    KLA
    SPECTRAFX 200
    Defect InspectionVintage: 0Condition: UsedLast Verified: Over 60 days ago
    KLA SPECTRAFX 200
    KLA
    SPECTRAFX 200
    Defect InspectionVintage: 2006Condition: UsedLast Verified: Over 60 days ago