
Description
Missing Parts: ESC, AUTO Matcher, Capacitor Matcher, Differential Pressure Gauge, Turbo Controller, NTM-DELTA,L/L Door Slit Assembly, Lift Up/Down Sensor, Lower Matching Box, IOC-0, PLC Unit Power Supply, NTM-DELTA Power Adapter, HRF Power Supply, LRF Power Supply, HRF Switching Box, Coaxial Cable, Backside He_MFC, Turbo Gate Valve BodyConfiguration
2 channels, includes: PFC detoxificationOEM Model Description
The Concept Two SPEED is a Novellus product that is designed for 200 mm wafers. It features a hemispherical source that is patented and delivers high throughput and manufacturability. The hemispherical source has a single excitation frequency and coil, which makes it simpler and more elegant than other systems that require multiple coils to approach the ion uniformity level of SPEED. The Concept Two SPEED is an HDP CVD system with three chambers that can accommodate the high pumping speeds required to operate at the mTorr pressures necessary for these CVD processes .Documents
No documents
CATEGORY
CVD
Last Verified: 14 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
143505
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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CONCEPT TWO "C2" SPEED
CATEGORY
CVD
Last Verified: 14 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
143505
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Missing Parts: ESC, AUTO Matcher, Capacitor Matcher, Differential Pressure Gauge, Turbo Controller, NTM-DELTA,L/L Door Slit Assembly, Lift Up/Down Sensor, Lower Matching Box, IOC-0, PLC Unit Power Supply, NTM-DELTA Power Adapter, HRF Power Supply, LRF Power Supply, HRF Switching Box, Coaxial Cable, Backside He_MFC, Turbo Gate Valve BodyConfiguration
2 channels, includes: PFC detoxificationOEM Model Description
The Concept Two SPEED is a Novellus product that is designed for 200 mm wafers. It features a hemispherical source that is patented and delivers high throughput and manufacturability. The hemispherical source has a single excitation frequency and coil, which makes it simpler and more elegant than other systems that require multiple coils to approach the ion uniformity level of SPEED. The Concept Two SPEED is an HDP CVD system with three chambers that can accommodate the high pumping speeds required to operate at the mTorr pressures necessary for these CVD processes .Documents
No documents