Description
Ozone Cabinet for a WJ1000. Was in storage to be used as spare. Ozone Generator Missing. Astex Sorbios Semozon 250.3 adv Part Number: 9/8825-002Configuration
1996 Ozone Cabinet for a WJ1000. Was in storage to be used as spare. Ozone Generator Missing. Astex Sorbios Semozon 250.3 adv Part Number: 9/8825-002OEM Model Description
The Watkins Johnson (WJ) WJ-1000 is an advanced chemical vapor deposition (APCVD) system specifically designed for high productivity in 200mm wafer processing lines. It offers two processing options: hybrid or TEOS-reactant processes. The system is capable of both doped and un-doped deposition of TEOS-based silicon dioxide, providing excellent flexibility for a wide range of dielectric film applications in various semiconductor manufacturing processes.Documents
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Verified
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Deinstalled
Product ID:
128498
Wafer Sizes:
Unknown
Vintage:
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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AVIZA / WATKINS-JOHNSON
WJ-1000
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Deinstalled
Product ID:
128498
Wafer Sizes:
Unknown
Vintage:
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Ozone Cabinet for a WJ1000. Was in storage to be used as spare. Ozone Generator Missing. Astex Sorbios Semozon 250.3 adv Part Number: 9/8825-002Configuration
1996 Ozone Cabinet for a WJ1000. Was in storage to be used as spare. Ozone Generator Missing. Astex Sorbios Semozon 250.3 adv Part Number: 9/8825-002OEM Model Description
The Watkins Johnson (WJ) WJ-1000 is an advanced chemical vapor deposition (APCVD) system specifically designed for high productivity in 200mm wafer processing lines. It offers two processing options: hybrid or TEOS-reactant processes. The system is capable of both doped and un-doped deposition of TEOS-based silicon dioxide, providing excellent flexibility for a wide range of dielectric film applications in various semiconductor manufacturing processes.Documents
No documents