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Watkins Johnson WJ-1000 APCVD TEOS Process: BPSG (TEOS, TMP, TMB, O3) Missing parts: UI,CCU-PC.PLC Loader/Unloader/Return-UNIT (ROBOTx3) Robot&Cont, USC-Cont, INJECTOR（whole)OEM Model Description
The Watkins Johnson (WJ) WJ-1000 is an advanced chemical vapor deposition (APCVD) system specifically designed for high productivity in 200mm wafer processing lines. It offers two processing options: hybrid or TEOS-reactant processes. The system is capable of both doped and un-doped deposition of TEOS-based silicon dioxide, providing excellent flexibility for a wide range of dielectric film applications in various semiconductor manufacturing processes.Documents
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AVIZA / WATKINS-JOHNSON
WJ-1000
Verified
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
75172
Wafer Sizes:
Unknown
Vintage:
Unknown
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AVIZA / WATKINS-JOHNSON
WJ-1000
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
75172
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Watkins Johnson WJ-1000 APCVD TEOS Process: BPSG (TEOS, TMP, TMB, O3) Missing parts: UI,CCU-PC.PLC Loader/Unloader/Return-UNIT (ROBOTx3) Robot&Cont, USC-Cont, INJECTOR（whole)OEM Model Description
The Watkins Johnson (WJ) WJ-1000 is an advanced chemical vapor deposition (APCVD) system specifically designed for high productivity in 200mm wafer processing lines. It offers two processing options: hybrid or TEOS-reactant processes. The system is capable of both doped and un-doped deposition of TEOS-based silicon dioxide, providing excellent flexibility for a wide range of dielectric film applications in various semiconductor manufacturing processes.Documents
No documents