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AVIZA / WATKINS-JOHNSON WJ-1000
  • AVIZA / WATKINS-JOHNSON WJ-1000
  • AVIZA / WATKINS-JOHNSON WJ-1000
  • AVIZA / WATKINS-JOHNSON WJ-1000
Description
No description
Configuration
Bulk list of parts for WJ 1000 LIST ATTACHED
OEM Model Description
The Watkins Johnson (WJ) WJ-1000 is an advanced chemical vapor deposition (APCVD) system specifically designed for high productivity in 200mm wafer processing lines. It offers two processing options: hybrid or TEOS-reactant processes. The system is capable of both doped and un-doped deposition of TEOS-based silicon dioxide, providing excellent flexibility for a wide range of dielectric film applications in various semiconductor manufacturing processes.
Documents
CATEGORY
CVD

Last Verified: Over 60 days ago

Key Item Details

Condition:

Parts Tool


Operational Status:

Unknown


Product ID:

82672


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AVIZA / WATKINS-JOHNSON

WJ-1000

verified-listing-icon
Verified
CATEGORY
CVD
Last Verified: Over 60 days ago
listing-photo-2e7be2c88f914613986535adc12e6a9e-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Key Item Details

Condition:

Parts Tool


Operational Status:

Unknown


Product ID:

82672


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
Bulk list of parts for WJ 1000 LIST ATTACHED
OEM Model Description
The Watkins Johnson (WJ) WJ-1000 is an advanced chemical vapor deposition (APCVD) system specifically designed for high productivity in 200mm wafer processing lines. It offers two processing options: hybrid or TEOS-reactant processes. The system is capable of both doped and un-doped deposition of TEOS-based silicon dioxide, providing excellent flexibility for a wide range of dielectric film applications in various semiconductor manufacturing processes.
Documents