Description
P500038 with 4 Chambers Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 150 mm Number of Chambers 4 Power Requirements 200-208 V 180.0 A 50/60 HzConfiguration
Chamber A/B TEOS Chamber C/D EtchOEM Model Description
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.Documents
No documents
CATEGORY
CVD
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
147426
Wafer Sizes:
Unknown
Vintage:
1992
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
APPLIED MATERIALS (AMAT)
P5000 CVD
CATEGORY
CVD
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
147426
Wafer Sizes:
Unknown
Vintage:
1992
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
P500038 with 4 Chambers Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 150 mm Number of Chambers 4 Power Requirements 200-208 V 180.0 A 50/60 HzConfiguration
Chamber A/B TEOS Chamber C/D EtchOEM Model Description
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.Documents
No documents