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APPLIED MATERIALS (AMAT) P5000 CVD
    Description
    No description
    Configuration
    CVD Chamber and DXZ Chamber
    OEM Model Description
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
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    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon

    Verified

    CATEGORY

    CVD
    Last Verified: Over 60 days ago
    Key Item Details

    Condition:

    Parts Tool


    Operational Status:

    Unknown


    Product ID:

    90250


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown

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    APPLIED MATERIALS (AMAT) P5000 CVD
    APPLIED MATERIALS (AMAT)P5000 CVDCVD
    Vintage: 0Condition: Used
    Last Verified2 days ago

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon

    Verified

    CATEGORY

    CVD
    Last Verified: Over 60 days ago
    listing-photo-8a014555585a4fc59ec364546c6a8c32-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2028/90250/85365db8b68c4272a4d5c3baa17fd7f4_c066dfef6ea6461c89f6eb251e0c9793unnamed1_mw.jpg
    Key Item Details

    Condition:

    Parts Tool


    Operational Status:

    Unknown


    Product ID:

    90250


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    CVD Chamber and DXZ Chamber
    OEM Model Description
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    Documents

    No documents

    Similar Listings
    View All
    APPLIED MATERIALS (AMAT) P5000 CVD
    APPLIED MATERIALS (AMAT)
    P5000 CVD
    CVDVintage: 0Condition: UsedLast Verified: 2 days ago
    APPLIED MATERIALS (AMAT) P5000 CVD
    APPLIED MATERIALS (AMAT)
    P5000 CVD
    CVDVintage: 0Condition: UsedLast Verified: 2 days ago
    APPLIED MATERIALS (AMAT) P5000 CVD
    APPLIED MATERIALS (AMAT)
    P5000 CVD
    CVDVintage: 0Condition: UsedLast Verified: 4 days ago