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APPLIED MATERIALS (AMAT) CENTURA HDP
    Description
    Main Frame Only, No Controller Rack
    Configuration
    No Configuration
    OEM Model Description
    The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.
    Documents

    No documents

    APPLIED MATERIALS (AMAT)

    CENTURA HDP

    verified-listing-icon

    Verified

    CATEGORY
    CVD

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    18372


    Wafer Sizes:

    8"/200mm


    Vintage:

    2000


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    APPLIED MATERIALS (AMAT) CENTURA HDP

    APPLIED MATERIALS (AMAT)

    CENTURA HDP

    CVD
    Vintage: 2000Condition: Used
    Last VerifiedOver 60 days ago

    APPLIED MATERIALS (AMAT)

    CENTURA HDP

    verified-listing-icon
    Verified
    CATEGORY
    CVD
    Last Verified: Over 60 days ago
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    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    18372


    Wafer Sizes:

    8"/200mm


    Vintage:

    2000


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Main Frame Only, No Controller Rack
    Configuration
    No Configuration
    OEM Model Description
    The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.
    Documents

    No documents

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