Description
10/1/26 System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller; Tool will be sold without SoftwareAMAT Vita/Delphin Controller Width 1,056.693 in (2,684.0 cm) Depth 986.220 in (2,505.0 cm) Height 944.882 in (2,400.0 cm) Weight 3,748 lb (1,700 kg)Configuration
Process Gases - PH3, SiH4, NF3, He, Argon, O2 Power Requirements - 208 V 100.0 A 50/60 Hz 3 PhaseOEM Model Description
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.Documents
No documents
CATEGORY
CVD
Last Verified: 11 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
148153
Wafer Sizes:
8"/200mm
Vintage:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA HDP
CATEGORY
CVD
Last Verified: 11 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
148153
Wafer Sizes:
8"/200mm
Vintage:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
10/1/26 System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller; Tool will be sold without SoftwareAMAT Vita/Delphin Controller Width 1,056.693 in (2,684.0 cm) Depth 986.220 in (2,505.0 cm) Height 944.882 in (2,400.0 cm) Weight 3,748 lb (1,700 kg)Configuration
Process Gases - PH3, SiH4, NF3, He, Argon, O2 Power Requirements - 208 V 100.0 A 50/60 Hz 3 PhaseOEM Model Description
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.Documents
No documents