Description
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Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process; Process Chambers: A,B,C; Orienter chamber F Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks, Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process Process Chambers: A,B,C Orienter chamber F System: 1x Mainframe 3x process chamber 1x Controller Rack 1x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) 1x Controller Rack x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller Process Capabilities: High Density Plasma Deposition Software Revision Level: WIN 10 Process Gases: SiH4, NF3, He, Argon, O2 Power Requirements: 208 V 100.0 A 50/60 Hz 3 Phase CE Marked YESOEM Model Description
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.Documents
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CATEGORY
CVD
Last Verified: 7 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
142476
Wafer Sizes:
8"/200mm
Vintage:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA HDP
CATEGORY
CVD
Last Verified: 7 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
142476
Wafer Sizes:
8"/200mm
Vintage:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process; Process Chambers: A,B,C; Orienter chamber F Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks, Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process Process Chambers: A,B,C Orienter chamber F System: 1x Mainframe 3x process chamber 1x Controller Rack 1x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) 1x Controller Rack x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller Process Capabilities: High Density Plasma Deposition Software Revision Level: WIN 10 Process Gases: SiH4, NF3, He, Argon, O2 Power Requirements: 208 V 100.0 A 50/60 Hz 3 Phase CE Marked YESOEM Model Description
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.Documents
No documents