Description

Description Dimension Qty MAIN BLOCK / 2DEV 102 58 90 1 FILTER BOX , THC DUCT 54 40 39 1 INTERFACE UNIT-1 55 37 69 1 INTERFACE UNIT-2 31 24 32 1 TEMPERATURE & HUMIDITY CONTROL UNIT 40 18 44 1 AC TRANSFORMER BOX 24 24 67 1

Configuration

PROCESS BLOCK : 2 DEVELOPER BLOCK TYPE : SINGLE WAFER FLOW : RIGHT to LEFT PSB / Process station block 2-1 : DEV -DUAL RINSE NOZZLE -H-NOZZLE 2-2 : DEV -DUAL RINSE NOZZLE -H-NOZZLE IFB / Interface station block -INTERFACE ARM -INTERFACER FOR NIKON STEPPER -2 UNI-CASSETTE -2 WAFER STAGE TEMPERATURE AND HUMIDITY CONTROLLER -T&H-CPC-2-NL , SHINWA 1 unit THRMO CONTROLLER -MR-2015 : 3 -FRD-8-B : 1 CIRCULATOR -MCE-52W-B : 2

OEM Model Description

Discover the CLEAN TRACK Mark 8, the cutting-edge coater developer system for 5 to 8-inch wafers. Building on the legacy of the acclaimed Mark V, this advanced model delivers enhanced productivity, superior scalability, and exceptional environmental control. Perfect for R&D and high-volume manufacturing, the Mark 8 ensures stable, top-tier performance for diverse applications.