Description
2 develop, WEE, 2 low temp hot plate, 1 chill plate Left, 2D, 2HP, 1COL Main Frame: Single Block -> Paired with NikonConfiguration
3 develop, 2 coat cups 2C, 2D, 1 WEE, 1AD, 2DHP, 6HP, 4 COL, 1 EXT Main Frame: Dual BlockOEM Model Description
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.Documents
No documents
TEL / TOKYO ELECTRON
MARK 8
Verified
CATEGORY
Coaters & Developers
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
105260
Wafer Sizes:
8"/200mm
Vintage:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
MARK 8
CATEGORY
Coaters & Developers
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
105260
Wafer Sizes:
8"/200mm
Vintage:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
2 develop, WEE, 2 low temp hot plate, 1 chill plate Left, 2D, 2HP, 1COL Main Frame: Single Block -> Paired with NikonConfiguration
3 develop, 2 coat cups 2C, 2D, 1 WEE, 1AD, 2DHP, 6HP, 4 COL, 1 EXT Main Frame: Dual BlockOEM Model Description
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.Documents
No documents