Description
The Gasonics L3510 plasma system is designed for ashing and cleaning semiconductor wafers. The Gasonics L3510 does this by creating monatomic oxygen the active specie, which chemically reacts with the photoresist on the surface of the wafer. The Gasonics L3510 system is composed of two main components: (1) The Process Sub-System The process sub-system includes the controller, microwave generator, gas flow control, cassette platform, and robot assembly. (2) The Vacuum Pump The vacuum pump is normally located in an adjacent equipment room separate from the main system. The pump should run continuously.Configuration
No ConfigurationOEM Model Description
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.Documents
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LAM RESEARCH / NOVELLUS / GASONICS
L3510
Verified
CATEGORY
Ashers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
83989
Wafer Sizes:
Unknown
Vintage:
Unknown
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LAM RESEARCH / NOVELLUS / GASONICS
L3510
CATEGORY
Ashers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
83989
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
The Gasonics L3510 plasma system is designed for ashing and cleaning semiconductor wafers. The Gasonics L3510 does this by creating monatomic oxygen the active specie, which chemically reacts with the photoresist on the surface of the wafer. The Gasonics L3510 system is composed of two main components: (1) The Process Sub-System The process sub-system includes the controller, microwave generator, gas flow control, cassette platform, and robot assembly. (2) The Vacuum Pump The vacuum pump is normally located in an adjacent equipment room separate from the main system. The pump should run continuously.Configuration
No ConfigurationOEM Model Description
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.Documents
No documents