PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.

Novellus acquired Gasonics in 2001. Novellus now offers a suite of advanced photoresist strip and clean products. 

LAM RESEARCH / NOVELLUS / GASONICS 

L3510

The Gasonics L3510 plasma system is designed for ashing and cleaning semiconductor wafers. The Gasonics L3510 does this by creating monatomic oxygen the active specie, which chemically reacts with the photoresist on the surface of the wafer. 

The Gasonics L3510 system is composed of two main components: 

(1) The Process Sub-System
The process sub-system includes the controller, microwave generator, gas flow control, cassette platform, and robot assembly.

(2) The Vacuum Pump 
The vacuum pump is normally located in an adjacent equipment room separate from the main system. 
The pump should run continuously.

L3510

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