The Aura 1000 is an advanced dry chemistry processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed to be used in the fabrication of ICs with feature sizes of 0.25 microns and below. The system provides a lower cost of ownership solution for advanced IC manufacturers and has a throughput rate ranging from approximately 45 to 55 wafers per hour, depending on wafer size and customer application.

Novellus acquired Gasonics in 2001. Novellus now offers a suite of advanced photoresist strip and clean products. 

LAM RESEARCH / NOVELLUS / GASONICS 

A1000 

PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.

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