KOKUSAI-ELECTRIC (KE)

DD 823V-8BL

"VERTEX-(S2).Model Numbers: DD-835V/DJ-835VAs semiconductor devices becomes more highly integrated and miniaturized, it is necessary to control native oxide film growth on the wafer surface at the time of loading for applications such as formation of contact Poly-Si, capacitor nitride, ultra thin oxidation and selective oxidation, etc.
Hitachi Kokusai Electric recommends Load Lock vertical Diffusion/LPCVD Systems, Vertron-V, for these processes to utilize the unique oxygen free load lock chamber mounted directly underneath reactor tube."

DJ 835

"VERTRON-III(J3). Model Numbers: DD-853V/DJ-853V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DD 853

MARORA

"VERTRON-V(S2). Model Numbers: DD-835V/DJ-853V. As semiconductor devices becomes more highly integrated and miniaturized, it is necessary to control native oxide film growth on the wafer surface at the time of loading for applications such as formation of contact Poly-Si, capacitor nitride, ultra thin oxidation and selective oxidation, etc.
Hitachi Kokusai Electric recommends Load Lock vertical Diffusion/LPCVD Systems, Vertron-V, for these processes to utilize the unique oxygen free load lock chamber mounted directly underneath reactor tube."

DJ-853

DD 853V-8BL2

QUIXACE ULTIMATE ALD SIO2

DD-802

DJ 1206-VN-DF

DJ1223VN-CX3	

DD-1206V-DF

QUIXACE DF

Kokusai: Vertex 5, loadlocked vertical tube LPCVD system.

VERTEX 5

DJ-802V-H

QUIXACE II CURE

DJ 1205V

VERTEX II

Zestone-III(C) DJ-1223V

ZESTONE- IIIC

DD1223V

QUIXACE NITRIDE

DD 1206VN-DM QUIXACE MINI

QUIXACE DJ-1206-VN

ZESTONE-V(B) DD-1205V

DJ 1206-VN HKE

ALDINNA DJ-1206VN-DM

QUIXACE II ALD HIGH-K

DD 1205V

DJ 1207S

QUIXACE DOPED POLY

DD1223VNP

ZESTONE NITR

QUIXACE ULTIMATE ALD TIN

DD 1236VN DF

500TC

QUIXACE-LV

DJ-813V

QUIXACE ULTIMATE

DD 823V-8PL

DD-1223 V-DF 

CX 9620

VERTRON Ⅲ DJ803

ZESTONE-V(B) DJ-1205V

DJ-807S-8C

QUIXACE II TEOS

ZESTONE-V(B) DJ-1205V-DF

DD 1206V DF

CX 5000

DJ 835-V-8L

ADVANCED ACE-300

DD 802V-B

VERTRON DJ-825V

DJ-823V-8BL

DJ-1810N-DLS

VERTRON 5S

An industrial vertical diffusion and chemical vapor deposition (CVD) furnace built for high-volume semiconductor manufacturing

DJ-853V-8BL3

QUIXACE ALDINNA

VERTRON III

VR300DE

DD-1810N-DLS

DJ-825V-8BL

***PARTS***

DJ803

SYMPHONYMC

Vertex-III(F)

VERTRON Ⅲ DD803

DJ 815V-8L

DD-812V

DD 802V H

DJ 853V

DJ-802V for LPCVD.
For LPCVD films, from 50 to 100 wafers are processed, depending on the film. 

DJ-802V

DD 853V

"VERTRON-III(F3) Model Numbers:DD-823V/DJ-823V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DD-823V

DD 803V

DD-802V for diffusion.
The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.

DD-802V

QUIXACE II

QUIXACE II DOPED POLY

DJ 803V

QUIXACE is KOKUSAI ELECTRIC's latest platform for batch thermal processing of 300mm wafers. The QUIXACE offers high throughput by utilizing advanced technologies in such areas as temperature control, wafer handling automation, reactor purging, and temperature ramping.

QUIXACE

VR-70

DJ-1206VN-DF

DJ 853V 8BL

DJ 1207S-DD

DJ 1236VN DF

"VERTRON-III(F3). Model Numbers: DD-823V/DJ-823V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DJ 823V

"VERTRON-III(G) Model Numbers:DD-833V/DJ-833V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

KOKUSAI-ELECTRIC (KE)

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