KOKUSAI-ELECTRIC (KE)

DJ 1206-VN HKE

"VERTEX-(S2).Model Numbers: DD-835V/DJ-835VAs semiconductor devices becomes more highly integrated and miniaturized, it is necessary to control native oxide film growth on the wafer surface at the time of loading for applications such as formation of contact Poly-Si, capacitor nitride, ultra thin oxidation and selective oxidation, etc.
Hitachi Kokusai Electric recommends Load Lock vertical Diffusion/LPCVD Systems, Vertron-V, for these processes to utilize the unique oxygen free load lock chamber mounted directly underneath reactor tube."

DJ 835

"VERTRON-III(J3). Model Numbers: DD-853V/DJ-853V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DD 853

MARORA

"VERTRON-V(S2). Model Numbers: DD-835V/DJ-853V. As semiconductor devices becomes more highly integrated and miniaturized, it is necessary to control native oxide film growth on the wafer surface at the time of loading for applications such as formation of contact Poly-Si, capacitor nitride, ultra thin oxidation and selective oxidation, etc.
Hitachi Kokusai Electric recommends Load Lock vertical Diffusion/LPCVD Systems, Vertron-V, for these processes to utilize the unique oxygen free load lock chamber mounted directly underneath reactor tube."

DJ-853

DD 853V-8BL2

DJ 835-V-8L

ADVANCED ACE-300

DD 802V-B

VERTRON DJ-825V

CX 5000

DD 1206V DF

DJ-823V-8BL

DJ-1810N-DLS

ZESTONE-V(B) DJ-1205V-DF

VERTRON 5S

DJ 1207S

DD 1205V

QUIXACE DJ-1206-VN

QUIXACE II ALD HIGH-K

ZESTONE-V(B) DD-1205V

ALDINNA DJ-1206VN-DM

QUIXACE II TEOS

QUIXACE ALDINNA

VERTRON III

DD-1810N-DLS

DJ-807S-8C

DJ-825V-8BL

***PARTS***

DJ803

DD 823V-8BL

SYMPHONYMC

Vertex-III(F)

ZESTONE-V(B) DJ-1205V

VERTRON Ⅲ DJ803

VERTRON Ⅲ DD803

CX 9620

DJ 815V-8L

QUIXACE ULTIMATE ALD SIO2

DD-802

DJ1206VN

DJ 1206-VN-DF

DJ1223VN-CX3	

DD-1223 V-DF 

DD-1206V-DF

QUIXACE DF

Kokusai: Vertex 5, loadlocked vertical tube LPCVD system.

VERTEX 5

DJ-802V-H

QUIXACE II CURE

DD 823V-8PL

QUIXACE ULTIMATE

DJ-813V

DJ 1205V

QUIXACE-LV

500TC

DD 1236VN DF

QUIXACE ULTIMATE ALD TIN

VERTEX II

Zestone-III(C) DJ-1223V

ZESTONE NITR

DD1223VNP

ZESTONE- IIIC

DD1223V

QUIXACE DOPED POLY

QUIXACE NITRIDE

DD 1206VN-DM QUIXACE MINI

DD 802V H

DD-812V

DD 803V

QUIXACE II

DJ-802V for LPCVD.
For LPCVD films, from 50 to 100 wafers are processed, depending on the film. 

DJ-802V

DJ 853V

QUIXACE II DOPED POLY

"VERTRON-III(F3) Model Numbers:DD-823V/DJ-823V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DD-823V

DD-802V for diffusion.
The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.

DD-802V

DD 853V

VR-70

"VERTRON-III(G) Model Numbers:DD-833V/DJ-833V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DJ 833V

DJ-1206VN-DF

QUIXACE II POLY

DJ 803V

QUIXACE is KOKUSAI ELECTRIC's latest platform for batch thermal processing of 300mm wafers. The QUIXACE offers high throughput by utilizing advanced technologies in such areas as temperature control, wafer handling automation, reactor purging, and temperature ramping.

QUIXACE

DJ 1207S-DD

"VERTRON-III(F3). Model Numbers: DD-823V/DJ-823V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DJ 823V

DJ 1206V-DF

DJ-1206VN	

DJ 1236VN DF

DJ 853V 8BL

DJ-1223VN	

CX 3202

QUIXACE ULTIMATE ALD SIN

QUIXACE II ANNEAL

DD803

CX 3000

CX1204

DJ-835V

DJ-1206VN-DM

ZESTONE-III: DD-1223V

"VERTRON-III(G) Model Numbers: DD-833V/DJ-833V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DD 833V

KOKUSAI-ELECTRIC (KE)

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