Description
SS-3000(2+2) With HDD, no missing part, de-installed by OEMConfiguration
[Chamber A] Process : Wafer surface clean Chuck : Vacuum Chuck SPRAY : Soft Spray N2 10~100NL/min Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ Spin DRY : 3000rpm Spin Dry only [Chamber B] Process : Wafer surface clean Chuck : Vacuum Chuck SPRAY : Soft Spray N2 10~100NL/min Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ Spin DRY : 3000rpm Spin Dry only [Chamber C] Process : Wafer Backside clean Chuck : Mechanical Chuck SPRAY : None Burush : PVA Burush Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ Spin DRY : 2400rpm Spin Dry onlyOEM Model Description
Wafer ScrubberDocuments
SCREEN / DNS / DAINIPPON SCREEN
SS-3000-AR
Verified
CATEGORY
Wet processing
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
92750
Wafer Sizes:
12"/300mm
Vintage:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SCREEN / DNS / DAINIPPON SCREEN
SS-3000-AR
Verified
CATEGORY
Wet processing
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
92750
Wafer Sizes:
12"/300mm
Vintage:
2006
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
SS-3000(2+2) With HDD, no missing part, de-installed by OEMConfiguration
[Chamber A] Process : Wafer surface clean Chuck : Vacuum Chuck SPRAY : Soft Spray N2 10~100NL/min Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ Spin DRY : 3000rpm Spin Dry only [Chamber B] Process : Wafer surface clean Chuck : Vacuum Chuck SPRAY : Soft Spray N2 10~100NL/min Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ Spin DRY : 3000rpm Spin Dry only [Chamber C] Process : Wafer Backside clean Chuck : Mechanical Chuck SPRAY : None Burush : PVA Burush Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ Spin DRY : 2400rpm Spin Dry onlyOEM Model Description
Wafer ScrubberDocuments
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