Screen Semiconductor offers a variety of products throughout the semiconductor manufacturing processes: Screen offer tools for the following processes: Wafer cleaning system, measurement system, coat/develop track, inspection system, annealing system, and advanced packaging lithography.

300mm wafer size wafer single wafer cleaning tool.

SCREEN / DNS / DAINIPPON SCREEN

SU-3000

F-Wet 300mm
Nano process capability for 45nm and lower
Provides throughput of up to 650 WPH
Short delivery time and fast setup
Highly stable and reliable
Flexible system configurations

FC-3100

SS-3000-AR

The Spin Scrubber SS-3000 is a cleaning system used in the semiconductor industry. It features increased processing capacity, C.O.O. reduction and user-friendly operation. The SS-3000 supports next-generation processes using 300 mm wafers and offers a reduced footprint. Its cleaning performance has been greatly enhanced to pass newer, stricter evaluation criteria. The SS-3000 is ideal for the increasingly reduced size of design rules, ensuring an ample process margin. Reduced chemical and DI water use combined with high-speed processing will minimize your running costs. Maintenance and other operations have been extensively automated to facilitate overall operability.

SS-3000

The WS-820L Wet Station is a cassetteless wafer cleaning system for 8-inch wafers. It can be custom-configured to meet your precise needs simply by combining compactly designed interface, processing, drying and transfer modules. The WS-820L is further distinguished by its high-tolerance processing, stability, and ease of operation and maintenance. It sets new benchmarks for productivity and advances the overall rationalization of the wafer rinsing process.

WS-820L

The 'SU-3100' Single-wafer cleaning system.
Up to 8 built-in chambers and superior 300 wafer per hour productivity.

SU-3100

The FC-3000 is the leading-edge single bath wet station for the next-generation 300 mm wafer cleaning. It is a combination of the best cleaning technologies taken from the WS-620/820 multi-bath wet station series and the ultra-clean processing capability of the F-WET single bath wet station series. This powerful combination of technologies allows you to obtain optimal cleaning results with both concentrated and dilute chemistries in a smaller, fixed footprint design. The FC-3000 has built-in tools such as the schedule optimization function which allows you to easily monitor equipment productivity indices such as throughput rate and Cost-of-Ownership information such as chemical/DI water consumption, enabling low C.O.O. and stable processing.

FC-3000

SS-3000-A

FS-820L

The SS-W80A-AR is a double-side scrubber that responds to the strict processing needs for the next-generation processes with complete contamination control and the latest precision processing capacity. The body is compact allowing installation space to be greatly reduced. Attention has also been paid to the operability, maintenance and safety. The SS-W80A-AR supports 8-inch wafers

SS-W80A-AR

 'SS-3100' next-generation single wafer cleaning system. It features eight chambers and takes up less space, while offering the industry's highest levels of productivity.

SS-3100

The FC-821L is a single-bath cleaning system that integrates our finest chemical circulation cleaning technologies, perfected in our renowned multi-bath Wet Stations. It is an unprecedentedly efficient system that incorporates a low-pressure dryer to prevent water mark generation during the drying processes. The FC-821L meets all the rigorous challenges of next-generation cleaning by realizing quarter-micron processing with accelerated throughput yet reduced chemical consumption. By decreasing cleaning units, as in the popular FS-820L, we can offer compact designs and radical space savings than previous multi-bath systems. Installing the FC-821L directly adjoining the next process equipment significantly slashes space demands in limited clean room environments. Moreover, the consequent minimized wafer transfer between processings greatly inhibits the generation of native oxides and other contamination.

FC-821L

FL-820L

The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.

AS-2000

The double-side scrubber SS-W60A-AR responds to the strict processing needs for the next-generation processes with complete contamination control and the latest precision processing capacity. The body is compact allowing installation space to be greatly reduced. Attention has also been paid to the operability, maintenance and safety. The SS-W60A-AR applies to 6-inch wafers, and the SS-W80A-AR supports 8-inch wafers

SS-W60A-AR

High Throughput Batch Cleaning Systems Enable Flexible Line Configurations:
WS-820C is for 200 mm wafers with carrier transfer processing.

WS-820C

SS-W629B

200mm wafer size single wafer cleaning system.

SS-W80A

DNS / DAINIPPON SS 80BW AR is the Scrubbers system. the SS 80BW can be used with 8” scrubber wafer size. It has a robot moving system. It has a side cabinet with high-pressure pumps.

SS-80BW-AR

Wafer size 50mm ~ 200mm
Half the Footprint, 1.5 Times the Productivity! Excellent Cost-Performance!
CW-2000 high-performance wet station with 50% smaller footprint and 150% higher productivity.

CW-2000

SS-W60A

Single-wafer cleaning system for 300mm wafers.
The AQUASPIN MP-3000 will be used for 0.13 μm and even precise cleaning processes,
supporting the finer design rules of advanced device technology.

MP-3000

SS-W80A-AVR

The AQUASPIN SU-3200 single wafer cleaning system is able to spray chemical to achieve individual wafer cleaning.

SU-3200

SS-60A-AR

High Throughput Batch Cleaning Systems Enable Flexible Line Configurations:
The WS-620C for 150 mm wafers.

WS-620C

SS-3300S scrubber type single wafer cleaning system.

SS-3300S

SS-W629-A

The DNS/ Dainppon SS80-BW is an wet station system. The DNS / Dainppon can be used with 8” wafer sizes and the scrubber size is also 8”. It has a 4-color GYWR petite type single tower and 4 type indexer unit. The spin unit on the front side is black acetal and the backside has a brush nozzle. 

SS-80BW

SS-W80A-A

SR-3000-AV

SS-80A-AV

Wafer size 150mm ~ 200mm
Inherits High-end Single Wafer Cleaning Technology to Deliver Outstanding Cost Performance. SU-2000 is a single-wafer cleaning system for ultra-thin substrate wafers. When the footprint of the SU-2000 (four-chamber specification) is compared with that of our existing two-chamber MP-2000, it is just 14 percent larger. This represents a major space saving and means the SU-2000 can be used to replace the MP-2000.

SU-2000

Wafer size 100mm ~ 200mm
Advanced Scrubber Featuring the Same Stability and Reliability as the Highly Regarded SS Series.
SS-80EX Spin Scrubber is a Single Wafer Cleaning Equipment for 200 mm Semiconductor Wafers.

SS-80EX

WS 820

SS W80-AR

SS-80AW-AVR

300mm wafer size single wafer cleaning tool.

SR-3000

WS-8200

SB-3300 hybrid type wafer back-side cleaning system is developed with both chemical and brush cleaning functions.

SB-3300

SS-W636

SD-W80A-AVFN

SS-W524

DNS / DAINIPPON SS W80B is a Scrubbers system. The SS W80B can produce wafer size of 8”.

SS-W80B

SR-8040-A

SS-W80DW-AR

SS-80

WS-820S

SS-W60A-A

SS-W80B-AR

SS-80BW-A

VP-C811

SS-W636-B

SS-W629-BV

The AQUASPIN SU-3300 single wafer cleaning system delivers industry-leading productivity and high processing performance.

SU-3300

WS-W625

SR-2000

MP-2000

The AQUASPIN SS-3200 is a single wafer cleaning system.

SS-3200

SS-80BW-AV

SS-60A

CW-1500 wafer cleaning system for manufacturing green devices. Full-scale entry into environmental technology fields including LEDs and power devices.

SCREEN / DNS / DAINIPPON SCREEN

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SU-3000

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