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SEMITOOL SIRIUS
    Description
    No description
    Configuration
    Ozone resist strip
    OEM Model Description
    Introduced to the market during fiscal 2002, the Sirius was designed specifically to deliver HydrOzone process. HydrOzone, using a minimal amount of deionized water and ozone is a low cost process option in comparison to the typical processes used for photoresist stripping, photolithography rework and organic cleans. The Sirius is a manually loaded semi-automated system with a 50 wafer capacity spray processing chamber. The system is available to accommodate either 200mm or 300mm wafer sizes.
    Documents

    No documents

    SEMITOOL

    SIRIUS

    verified-listing-icon

    Verified

    CATEGORY
    Wet Benches - Manual

    Last Verified: 16 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    111843

    Wafer Sizes:

    Unknown

    Vintage:

    2002

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    SEMITOOL SIRIUS

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    Wet Benches - Manual
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    Last Verified12 days ago
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    SEMITOOL SIRIUS

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    Wet Benches - Manual
    Vintage: 2004Condition: Used
    Last VerifiedOver 60 days ago

    SEMITOOL

    SIRIUS

    verified-listing-icon
    Verified
    CATEGORY
    Wet Benches - Manual
    Last Verified: 16 days ago
    listing-photo-91be776a71f9487fa6e6b5c2091deb9f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/47239/91be776a71f9487fa6e6b5c2091deb9f/4bccd23feafa448da3ebc06d6282d1a8_fda6b191366b4829baa6f7fb5baf4c0245005c_mw.jpeg
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    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    111843

    Wafer Sizes:

    Unknown

    Vintage:

    2002

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Ozone resist strip
    OEM Model Description
    Introduced to the market during fiscal 2002, the Sirius was designed specifically to deliver HydrOzone process. HydrOzone, using a minimal amount of deionized water and ozone is a low cost process option in comparison to the typical processes used for photoresist stripping, photolithography rework and organic cleans. The Sirius is a manually loaded semi-automated system with a 50 wafer capacity spray processing chamber. The system is available to accommodate either 200mm or 300mm wafer sizes.
    Documents

    No documents

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    View All
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