Description
No descriptionConfiguration
Ozone resist stripOEM Model Description
Introduced to the market during fiscal 2002, the Sirius was designed specifically to deliver HydrOzone process. HydrOzone, using a minimal amount of deionized water and ozone is a low cost process option in comparison to the typical processes used for photoresist stripping, photolithography rework and organic cleans. The Sirius is a manually loaded semi-automated system with a 50 wafer capacity spray processing chamber. The system is available to accommodate either 200mm or 300mm wafer sizes.Documents
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SEMITOOL
SIRIUS
Verified
CATEGORY
Spray Solvent / Acid
Last Verified: 25 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
111843
Wafer Sizes:
Unknown
Vintage:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SEMITOOL
SIRIUS
CATEGORY
Spray Solvent / Acid
Last Verified: 25 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
111843
Wafer Sizes:
Unknown
Vintage:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Ozone resist stripOEM Model Description
Introduced to the market during fiscal 2002, the Sirius was designed specifically to deliver HydrOzone process. HydrOzone, using a minimal amount of deionized water and ozone is a low cost process option in comparison to the typical processes used for photoresist stripping, photolithography rework and organic cleans. The Sirius is a manually loaded semi-automated system with a 50 wafer capacity spray processing chamber. The system is available to accommodate either 200mm or 300mm wafer sizes.Documents
No documents