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TEL / TOKYO ELECTRON SS4
  • TEL / TOKYO ELECTRON SS4
  • TEL / TOKYO ELECTRON SS4
  • TEL / TOKYO ELECTRON SS4
Description
No description
Configuration
No Configuration
OEM Model Description
The SS-4 is a stand-alone wafer scrubber system developed by TEL. It is based on the Clean Track Mark 7 photoresist processing system and utilizes the Mark 7’s non-vacuum wafer handling capability. With TEL’s unique brushes and mechanical chuck, the SS-4 is capable of cleaning both sides of the wafer on a carrier-to-carrier basis, contributing remarkably to enhancing the megabit process yield. The SS-4 also offers the option to expand the variety of cleaning processes by combining the brush with a jet or Megasonic cleaning dispenser. Additionally, the SS-4 features TEL’s newest cleaning head, the hydraulic membrane head, which can be used with patterned, hydrophobic surfaces and even soft metal layers, expanding the applications for which scrubbers can be used.
Documents

No documents

CATEGORY
Wafer Scrubber

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

113517


Wafer Sizes:

8"/200mm


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

TEL / TOKYO ELECTRON

SS4

verified-listing-icon
Verified
CATEGORY
Wafer Scrubber
Last Verified: Over 60 days ago
listing-photo-8e8c20e139ad4388a232523b5ee92ae8-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

113517


Wafer Sizes:

8"/200mm


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
No Configuration
OEM Model Description
The SS-4 is a stand-alone wafer scrubber system developed by TEL. It is based on the Clean Track Mark 7 photoresist processing system and utilizes the Mark 7’s non-vacuum wafer handling capability. With TEL’s unique brushes and mechanical chuck, the SS-4 is capable of cleaning both sides of the wafer on a carrier-to-carrier basis, contributing remarkably to enhancing the megabit process yield. The SS-4 also offers the option to expand the variety of cleaning processes by combining the brush with a jet or Megasonic cleaning dispenser. Additionally, the SS-4 features TEL’s newest cleaning head, the hydraulic membrane head, which can be used with patterned, hydrophobic surfaces and even soft metal layers, expanding the applications for which scrubbers can be used.
Documents

No documents