Description
Wafer ScrubberConfiguration
Process: SCRUB Software Version: 6.00.26.2 System Power Rating: 208 AC 3-Phase Loading Configuration: 4 Load PortsOEM Model Description
The features of the NS300+ HT process module - renowned for its reliability and stability - have been carried on into the new NS300Z, a more productive scrubber. The system has an 8-process spin chamber and achieves a throughput of up to 1,000 wafers per hour (200% of the previous system). Unique function is also equipped to realize the prevention of contamination during wafer transport, while keeping high productivity. In addition, the Atomized Spray 2 (AS2) and brushes succeeding from the previous system was improved. The NS300Z provides a wide range of scrubber clean process with high productivity even in cutting-edge device manufacturing.Documents
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TEL / TOKYO ELECTRON
NS300Z
Verified
CATEGORY
Wafer Scrubber
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
33423
Wafer Sizes:
12"/300mm
Vintage:
2016
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
NS300Z
Verified
CATEGORY
Wafer Scrubber
Last Verified: 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
33423
Wafer Sizes:
12"/300mm
Vintage:
2016
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Wafer ScrubberConfiguration
Process: SCRUB Software Version: 6.00.26.2 System Power Rating: 208 AC 3-Phase Loading Configuration: 4 Load PortsOEM Model Description
The features of the NS300+ HT process module - renowned for its reliability and stability - have been carried on into the new NS300Z, a more productive scrubber. The system has an 8-process spin chamber and achieves a throughput of up to 1,000 wafers per hour (200% of the previous system). Unique function is also equipped to realize the prevention of contamination during wafer transport, while keeping high productivity. In addition, the Atomized Spray 2 (AS2) and brushes succeeding from the previous system was improved. The NS300Z provides a wide range of scrubber clean process with high productivity even in cutting-edge device manufacturing.Documents
No documents