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KLA UV-1280SE
  • KLA UV-1280SE
  • KLA UV-1280SE
  • KLA UV-1280SE
Description
No description
Configuration
No Configuration
OEM Model Description
The Prometrix UV-1280SE is a production thin film measurement system that combines dual-beam spectrophotometry and broadband spectroscopic ellipsometry. It can directly measure film thickness, refractive index, and extinction coefficient of single- and multi-layer thin film stacks simultaneously. The system is easy to use, lowers cost of ownership, and increases production efficiency. It is useful for both process control and advanced materials development.
Documents

No documents

PREFERRED
 
SELLER
verified-listing-icon

Verified

CATEGORY
Thin Film / Film Thickness

Last Verified: Over 30 days ago

Buyer pays 12% premium of final sale price
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

125563


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PREFERRED
 
SELLER

KLA

UV-1280SE

verified-listing-icon
Verified
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 30 days ago
listing-photo-9817813a19e74db8aa8b8a8655dceb28-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Buyer pays 12% premium of final sale price
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

125563


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
No Configuration
OEM Model Description
The Prometrix UV-1280SE is a production thin film measurement system that combines dual-beam spectrophotometry and broadband spectroscopic ellipsometry. It can directly measure film thickness, refractive index, and extinction coefficient of single- and multi-layer thin film stacks simultaneously. The system is easy to use, lowers cost of ownership, and increases production efficiency. It is useful for both process control and advanced materials development.
Documents

No documents