Description
No descriptionConfiguration
Gigaphoton laser 1) Original temperature: 23° 2) Original Altitude normal pressure: 755mmHg 3) Lens type: Nikon standard 4) Rack type: Right Type 5) Wafer Carrier Table: Left 6) Reticle Library: Center 7) Main unit with 0.68 NA (Auto Variable , SHRINC Conventional) Sigma 0.75 8) Pellicle reticle loader (PRL) YES 9) System for 6” reticle 6 Inch (NON-SMIF) 10) 25mm X 33mm field size YES 11) LSA system YES 12) FIA l//system YES 13) Illumination model: (Conventional, Annular,) 14) 8” wafer loader (WL Type-3), 8”ceramic holder, Flat ZONE: In 6 O'clock FLAT Type 8Inch 15) Pellicle reticle detector YES 16) BMU Type Standard 17) Pre-alignment non contact pre-alignment: Non Contact 18) Chip leveling YES 19) NEMA Box YES 20) Tool software MCSV : 3.44 21) Laser Type Giga Photon 22) Chamber Type Asahi N5Z1102 (2000.02)OEM Model Description
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.Documents
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NIKON
NSR-S204B
Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
111988
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
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NIKON
NSR-S204B
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
111988
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Gigaphoton laser 1) Original temperature: 23° 2) Original Altitude normal pressure: 755mmHg 3) Lens type: Nikon standard 4) Rack type: Right Type 5) Wafer Carrier Table: Left 6) Reticle Library: Center 7) Main unit with 0.68 NA (Auto Variable , SHRINC Conventional) Sigma 0.75 8) Pellicle reticle loader (PRL) YES 9) System for 6” reticle 6 Inch (NON-SMIF) 10) 25mm X 33mm field size YES 11) LSA system YES 12) FIA l//system YES 13) Illumination model: (Conventional, Annular,) 14) 8” wafer loader (WL Type-3), 8”ceramic holder, Flat ZONE: In 6 O'clock FLAT Type 8Inch 15) Pellicle reticle detector YES 16) BMU Type Standard 17) Pre-alignment non contact pre-alignment: Non Contact 18) Chip leveling YES 19) NEMA Box YES 20) Tool software MCSV : 3.44 21) Laser Type Giga Photon 22) Chamber Type Asahi N5Z1102 (2000.02)OEM Model Description
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.Documents
No documents