Description
Photolithography Scanner 248nm Handler System - WL Type 3 Interface - Open CassetteConfiguration
Software Version - MCSV CIM - SECS Process - PhotolithographyOEM Model Description
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.Documents
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NIKON
NSR-S204B
CATEGORY
Steppers & Scanners
Last Verified: 6 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
146714
Wafer Sizes:
8"/200mm
Vintage:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Photolithography Scanner 248nm Handler System - WL Type 3 Interface - Open CassetteConfiguration
Software Version - MCSV CIM - SECS Process - PhotolithographyOEM Model Description
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.Documents
No documents