Description
Equipment description: I-line stepperConfiguration
No ConfigurationOEM Model Description
"This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.Documents
No documents
Verified
CATEGORY
Steppers & Scanners
Last Verified: 6 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
139503
Wafer Sizes:
6"/150mm
Vintage:
1997
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NIKON
NSR-2205i12D
CATEGORY
Steppers & Scanners
Last Verified: 6 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
139503
Wafer Sizes:
6"/150mm
Vintage:
1997
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Equipment description: I-line stepperConfiguration
No ConfigurationOEM Model Description
"This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.Documents
No documents