Description
NIKON I-line lithography machine Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.Configuration
0.45 0.57 5:1 20*20 FIA:130 LSA:100OEM Model Description
The NSR-2005i10C is a stepper that uses an I-line light source with a wavelength of 365 nanometers. It achieves a resolution of 0.45 micron or better over a wide exposure area of 22mm x 22mm to 17.9mm x 25.2mm. With an optional feature called Shrine (Super High Resolution by Illumination Control), the resolution can be improved to 0.35 micron or better. This stepper is capable of mass-producing 16Mbit DRAMs at its normal resolution of 0.45 micron.Documents
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Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131655
Wafer Sizes:
2"/50mm, 4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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NIKON
NSR-2005i9C
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131655
Wafer Sizes:
2"/50mm, 4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
NIKON I-line lithography machine Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.Configuration
0.45 0.57 5:1 20*20 FIA:130 LSA:100OEM Model Description
The NSR-2005i10C is a stepper that uses an I-line light source with a wavelength of 365 nanometers. It achieves a resolution of 0.45 micron or better over a wide exposure area of 22mm x 22mm to 17.9mm x 25.2mm. With an optional feature called Shrine (Super High Resolution by Illumination Control), the resolution can be improved to 0.35 micron or better. This stepper is capable of mass-producing 16Mbit DRAMs at its normal resolution of 0.45 micron.Documents
No documents