Description
ASML PAS 5500/1150 C Wafer Stepper w/ 2x2 cassette/transfer loader 1ea Cymer NL7600A NanoLith laser system, 400V, 70A 1ea mains power cabinet; 1ea Donaldson P199100 LithoGuard filtration unit 1ea Rietschle Thomas SAH 55 (10) exhaust blower 1ea Rietschle Thomas REL 44050 (23) exhaust blower cabinet 1ea Quality Power Solutions uninterruptible power system w/ battery pack Powervar ABC75.0-48D40Y 2000 Series GPI power conditioner, 75kVA. 120in x 72in x 99in H.Configuration
No ConfigurationOEM Model Description
The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass production. It is the solution for both 90-nm critical and non critical ArF layers, and can be configured with a number of options that enable low-k 1 in manufacturing, extending application of the PAS 5500/1150C below 90 nm.Documents
No documents
Verified
CATEGORY
Steppers & Scanners
Last Verified: 11 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
149410
Wafer Sizes:
Unknown
Vintage:
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ASML
PAS 5500/1150C
CATEGORY
Steppers & Scanners
Last Verified: 11 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
149410
Wafer Sizes:
Unknown
Vintage:
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
ASML PAS 5500/1150 C Wafer Stepper w/ 2x2 cassette/transfer loader 1ea Cymer NL7600A NanoLith laser system, 400V, 70A 1ea mains power cabinet; 1ea Donaldson P199100 LithoGuard filtration unit 1ea Rietschle Thomas SAH 55 (10) exhaust blower 1ea Rietschle Thomas REL 44050 (23) exhaust blower cabinet 1ea Quality Power Solutions uninterruptible power system w/ battery pack Powervar ABC75.0-48D40Y 2000 Series GPI power conditioner, 75kVA. 120in x 72in x 99in H.Configuration
No ConfigurationOEM Model Description
The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass production. It is the solution for both 90-nm critical and non critical ArF layers, and can be configured with a number of options that enable low-k 1 in manufacturing, extending application of the PAS 5500/1150C below 90 nm.Documents
No documents