Description
PVD / Sputter Missing Parts: HDD、ChillerConfiguration
FI:5.3 FI Robot: KAWASAKI FIS: 0190-22269 FES: 0190-17956 Buffer & Xfer Robot: XP Robot Ch-1: NA Ch-2: Ti, DC Power Supply: ENI DCG-200E OPTIMA Ch-3: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-4: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-5: NA Ch-A: Pass Ch-B: Cool Ch-C: PC-XT RF Generator: COMDEL CDX-2000 Ch-D: PC-XT RF Generator: COMDEL CDX-2000 Ch-E: Degas (Single Heat) Ch-F: Degas (Single Heat) Cryo Compressor: CTI IS-1000 x2set Dry Pump: KASHIYAMA SDE603A-066 x2set KASHIYAMA MU300 x2set TOYOTA EC100L x1setOEM Model Description
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.Documents
No documents
APPLIED MATERIALS (AMAT)
ENDURA II
Verified
CATEGORY
PVD / Sputtering
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
44742
Wafer Sizes:
12"/300mm
Vintage:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
APPLIED MATERIALS (AMAT)
ENDURA II
CATEGORY
PVD / Sputtering
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
44742
Wafer Sizes:
12"/300mm
Vintage:
2006
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
PVD / Sputter Missing Parts: HDD、ChillerConfiguration
FI:5.3 FI Robot: KAWASAKI FIS: 0190-22269 FES: 0190-17956 Buffer & Xfer Robot: XP Robot Ch-1: NA Ch-2: Ti, DC Power Supply: ENI DCG-200E OPTIMA Ch-3: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-4: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-5: NA Ch-A: Pass Ch-B: Cool Ch-C: PC-XT RF Generator: COMDEL CDX-2000 Ch-D: PC-XT RF Generator: COMDEL CDX-2000 Ch-E: Degas (Single Heat) Ch-F: Degas (Single Heat) Cryo Compressor: CTI IS-1000 x2set Dry Pump: KASHIYAMA SDE603A-066 x2set KASHIYAMA MU300 x2set TOYOTA EC100L x1setOEM Model Description
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.Documents
No documents