Description
AL 2CH, TTN 1CH, SIP 2CH, ALPS 1CH, PcXT 1CH, Degas (STD) 2CH, Gray RackConfiguration
AL 2CH, TTN 1CH, SIP 2CH, ALPS 1CH, PcXT 1CH, Degas (STD) 2CHOEM Model Description
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.Documents
No documents
APPLIED MATERIALS (AMAT)
ENDURA II
Verified
CATEGORY
PVD / Sputtering
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
84808
Wafer Sizes:
12"/300mm
Vintage:
2007
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Money Back Guarantee
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View AllAPPLIED MATERIALS (AMAT)
ENDURA II
Verified
CATEGORY
PVD / Sputtering
Last Verified: 18 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
84808
Wafer Sizes:
12"/300mm
Vintage:
2007
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
AL 2CH, TTN 1CH, SIP 2CH, ALPS 1CH, PcXT 1CH, Degas (STD) 2CH, Gray RackConfiguration
AL 2CH, TTN 1CH, SIP 2CH, ALPS 1CH, PcXT 1CH, Degas (STD) 2CHOEM Model Description
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.Documents
No documents