Description
Semiconductor Wafer Electroplating System Electroplating cup reactors for uniform films. Simple manual load system. Two chambers. Internal lines leached and exterior wiped clean. 208V, 3 Ph, 50/60 Hz, 40AConfiguration
Model EQ212PMPLTNG150 EQUINOX The tool is not functional. Known issues: Robot connections issues, plating cell power supply drifting current away and not keeping up with recipe target current, CP2 head not working. Ran at 200mm. We had the 150mm conversion kit. Single wafer process head design. Fountain plater with 2 separate plating bath tanks and 2 SRD heads, total of 4 heads. Cassette to Cassette - input cassette on the left nest and output cassette on the right nest. 2 x SRD chambers + 2 x Plating chambers. Working area - 6’ x 4’ (W x L) Power supply - Dynatronix Model PMC 102/1PR-20-30XR, part # 990-0296-212OEM Model Description
Equinox is a single wafer, multi-chamber process platform for cassette-to-cassette cleaning, etching, developing, and electroplating. It offers configurations from one to six chambers with a centralized controller and robotics. The platform is capable of performing various processes on substrates ranging from 3" to 200mm in size. It works by using a central dual end-effector robot to transfer substrates from cassette to chamber and back again. Equinox can help automate manual steps and transfers while increasing throughput with a small footprint. It offers ultra-clean dry-to-dry operation with uniform plating and etching results. The platform can integrate sequential process steps with a low cost of ownership (CoO) and provides a migration path from small R&D platforms to production systems with the same process chambers and control features.Documents
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SEMITOOL
EQUINOX
Verified
CATEGORY
Spray Solvent / Acid
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
75903
Wafer Sizes:
Unknown
Vintage:
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SEMITOOL
EQUINOX
CATEGORY
Spray Solvent / Acid
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
75903
Wafer Sizes:
Unknown
Vintage:
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Semiconductor Wafer Electroplating System Electroplating cup reactors for uniform films. Simple manual load system. Two chambers. Internal lines leached and exterior wiped clean. 208V, 3 Ph, 50/60 Hz, 40AConfiguration
Model EQ212PMPLTNG150 EQUINOX The tool is not functional. Known issues: Robot connections issues, plating cell power supply drifting current away and not keeping up with recipe target current, CP2 head not working. Ran at 200mm. We had the 150mm conversion kit. Single wafer process head design. Fountain plater with 2 separate plating bath tanks and 2 SRD heads, total of 4 heads. Cassette to Cassette - input cassette on the left nest and output cassette on the right nest. 2 x SRD chambers + 2 x Plating chambers. Working area - 6’ x 4’ (W x L) Power supply - Dynatronix Model PMC 102/1PR-20-30XR, part # 990-0296-212OEM Model Description
Equinox is a single wafer, multi-chamber process platform for cassette-to-cassette cleaning, etching, developing, and electroplating. It offers configurations from one to six chambers with a centralized controller and robotics. The platform is capable of performing various processes on substrates ranging from 3" to 200mm in size. It works by using a central dual end-effector robot to transfer substrates from cassette to chamber and back again. Equinox can help automate manual steps and transfers while increasing throughput with a small footprint. It offers ultra-clean dry-to-dry operation with uniform plating and etching results. The platform can integrate sequential process steps with a low cost of ownership (CoO) and provides a migration path from small R&D platforms to production systems with the same process chambers and control features.Documents
No documents