Description
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The S-4700 Type I is a cutting-edge electron microscope with remarkable features. It offers high-resolution imaging at low accelerating voltages, ensuring a guaranteed resolution of 2.1 nm at 1 kV. Routine microscopy is made convenient with a long working distance of 12 mm, allowing sample exchange via an airlock without the need for repositioning. At 15 kV, the microscope maintains a high resolution of 1.5 nm. Additionally, it enables a sample tilt of 45 degrees without altering the working distance and offers a high X-ray take-off angle of 30 degrees with the sample normal to the beam. The instrument boasts an integrated electron detector for both secondary electrons (SE) and backscattered electrons (BSE), allowing operators to choose the best imaging mode for their samples. With complete column setup controlled through a computer interface, users can effortlessly switch between ultra-high-resolution mode and analysis mode. The unique objective lens design permits simultaneous use of YAG-type BSE and EDX detectors, enhancing imaging versatility.Documents
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HITACHI
S-4700 I
Verified
CATEGORY
SEM / FIB
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
23974
Wafer Sizes:
Unknown
Vintage:
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllHITACHI
S-4700 I
CATEGORY
SEM / FIB
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
23974
Wafer Sizes:
Unknown
Vintage:
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The S-4700 Type I is a cutting-edge electron microscope with remarkable features. It offers high-resolution imaging at low accelerating voltages, ensuring a guaranteed resolution of 2.1 nm at 1 kV. Routine microscopy is made convenient with a long working distance of 12 mm, allowing sample exchange via an airlock without the need for repositioning. At 15 kV, the microscope maintains a high resolution of 1.5 nm. Additionally, it enables a sample tilt of 45 degrees without altering the working distance and offers a high X-ray take-off angle of 30 degrees with the sample normal to the beam. The instrument boasts an integrated electron detector for both secondary electrons (SE) and backscattered electrons (BSE), allowing operators to choose the best imaging mode for their samples. With complete column setup controlled through a computer interface, users can effortlessly switch between ultra-high-resolution mode and analysis mode. The unique objective lens design permits simultaneous use of YAG-type BSE and EDX detectors, enhancing imaging versatility.Documents
No documents