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KLA OmniMap RS200+
    Description
    -8inch (Open Cassette) -F Probe(27.9kΩ/sq, 279.4Ω/sq, 2.794Ω/sq) -Galil Motion Controller -I7 Computer -Dual Probe Arm: P1 / P2 -LP1: 200mm OCA+ -LP2: 200mm OCA+ -RS SW: 10.0.0.6
    Configuration
    -Measurement range: > 5 mΩ/sq. to < 5 MΩ/sq -Measurement repeatability, based on KLA-Tencor’s “Probe Qualification Test” @ 1” test diameter, using the appropriate probe head: < 0.2% (1σ) -Reproducibility: Representative metals (e.g. Cu, W, TiN) < 0.5% (1σ) -Edge exclusion: From the conductive film edge for the following the probe heads: 25 mil pitch -1 mm with “enhanced” probe position 25 mil pitch -3 mm with “standard” probe position 40 mil pitch -4 mm with “standard” probe position 62.5 mil pitch -5 mm with “standard” probe position -Temperature measurement accuracy: ± 0.5°C -Temperature measurement repeatability: ± 0.2°C -Throughput: based on 5-site test with wafer alignment, fixed current and temperature compensation. 200 mm Single SMIF: ≥ 110 WPH -Measurement Capabilities Routine check: 1-30 sites programmable (ASTM standard tests included) XY maps and flexible, user-defined patterns: up to 1,200 sites programmable -Analysis Capabilities Contour/3-D map: 49, 81, 121, 225, 361, 441, 625 sites Diameter scan: 49, 81, 121, 225, 361, 441, 625 sites Probe qualification test: 20 sites Trend charts Recipe editing and data extraction capability Average, difference and ratio maps Temperature coefficient of resistance correction
    OEM Model Description
    Sheet Resistance Measurement Systems The OmniMap® RS-200 resistivity mapping system, based on proven industry resistivity mapping standards, provides accurate and reliable sheet resistance measurement for 45nm and beyond. This resistivity mapping system provides capabilities such as advanced automation and improved edge performance to meet today's 300mm wafer production requirements.
    Documents

    KLA

    OmniMap RS200+

    verified-listing-icon

    Verified

    CATEGORY
    Resistivity / Four Point Probe

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Installed / Running


    Product ID:

    111610


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    KLA OmniMap RS200+

    KLA

    OmniMap RS200+

    Resistivity / Four Point Probe
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    KLA

    OmniMap RS200+

    verified-listing-icon
    Verified
    CATEGORY
    Resistivity / Four Point Probe
    Last Verified: Over 60 days ago
    listing-photo-070ea67b8915473f89d973e2fd131336-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/50345/070ea67b8915473f89d973e2fd131336/e2da67bb493243119b72cafdb5172dcc_f6a34097bcf74b13b2b9c7eae4f77f9445005c_mw.jpeg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Installed / Running


    Product ID:

    111610


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    -8inch (Open Cassette) -F Probe(27.9kΩ/sq, 279.4Ω/sq, 2.794Ω/sq) -Galil Motion Controller -I7 Computer -Dual Probe Arm: P1 / P2 -LP1: 200mm OCA+ -LP2: 200mm OCA+ -RS SW: 10.0.0.6
    Configuration
    -Measurement range: > 5 mΩ/sq. to < 5 MΩ/sq -Measurement repeatability, based on KLA-Tencor’s “Probe Qualification Test” @ 1” test diameter, using the appropriate probe head: < 0.2% (1σ) -Reproducibility: Representative metals (e.g. Cu, W, TiN) < 0.5% (1σ) -Edge exclusion: From the conductive film edge for the following the probe heads: 25 mil pitch -1 mm with “enhanced” probe position 25 mil pitch -3 mm with “standard” probe position 40 mil pitch -4 mm with “standard” probe position 62.5 mil pitch -5 mm with “standard” probe position -Temperature measurement accuracy: ± 0.5°C -Temperature measurement repeatability: ± 0.2°C -Throughput: based on 5-site test with wafer alignment, fixed current and temperature compensation. 200 mm Single SMIF: ≥ 110 WPH -Measurement Capabilities Routine check: 1-30 sites programmable (ASTM standard tests included) XY maps and flexible, user-defined patterns: up to 1,200 sites programmable -Analysis Capabilities Contour/3-D map: 49, 81, 121, 225, 361, 441, 625 sites Diameter scan: 49, 81, 121, 225, 361, 441, 625 sites Probe qualification test: 20 sites Trend charts Recipe editing and data extraction capability Average, difference and ratio maps Temperature coefficient of resistance correction
    OEM Model Description
    Sheet Resistance Measurement Systems The OmniMap® RS-200 resistivity mapping system, based on proven industry resistivity mapping standards, provides accurate and reliable sheet resistance measurement for 45nm and beyond. This resistivity mapping system provides capabilities such as advanced automation and improved edge performance to meet today's 300mm wafer production requirements.
    Documents
    Similar Listings
    View All
    KLA OmniMap RS200+

    KLA

    OmniMap RS200+

    Resistivity / Four Point ProbeVintage: 0Condition: UsedLast Verified:Over 60 days ago