Description
It is strictly an RF system. Operational. It can handle up to three targets and the backing plates are not with the system.Configuration
No ConfigurationOEM Model Description
The Perkin-Elmer 4400 Series is a fast cycle, water-cooled load locked system that uses circular or delta style cathodes. It has the advantage of eliminating the need to vent the process chamber for loading and unloading substrates, reducing pump down time, contamination, and target burn-in. This increases material utilization. The system is a general-purpose sputtering system with up to four 8 inch diameter circular cathodes that can use DC Magnetron, RF Magnetron, or RF Diode configurations. These can be sputtered sequentially without breaking vacuum. Power sources are available up to 2 kW RF and 5 kW DC.Documents
No documents
PERKIN ELMER
4400
Verified
CATEGORY
PVD / Sputtering
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
49030
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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PERKIN ELMER
4400
CATEGORY
PVD / Sputtering
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
49030
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
It is strictly an RF system. Operational. It can handle up to three targets and the backing plates are not with the system.Configuration
No ConfigurationOEM Model Description
The Perkin-Elmer 4400 Series is a fast cycle, water-cooled load locked system that uses circular or delta style cathodes. It has the advantage of eliminating the need to vent the process chamber for loading and unloading substrates, reducing pump down time, contamination, and target burn-in. This increases material utilization. The system is a general-purpose sputtering system with up to four 8 inch diameter circular cathodes that can use DC Magnetron, RF Magnetron, or RF Diode configurations. These can be sputtered sequentially without breaking vacuum. Power sources are available up to 2 kW RF and 5 kW DC.Documents
No documents