The Perkin-Elmer 4400 Series is a fast cycle, water-cooled load locked system that uses circular or delta style cathodes. It has the advantage of eliminating the need to vent the process chamber for loading and unloading substrates, reducing pump down time, contamination, and target burn-in. This increases material utilization. The system is a general-purpose sputtering system with up to four 8 inch diameter circular cathodes that can use DC Magnetron, RF Magnetron, or RF Diode configurations. These can be sputtered sequentially without breaking vacuum. Power sources are available up to 2 kW RF and 5 kW DC.

PERKIN ELMER

4400

2400

The Perkin-Elmer 4450 is a type of sputtering system that belongs to the Perkin-Elmer 4400 Series. It is similar to the Model 4410, but has additional features such as load lock pumping and substrate heating. The system can operate automatically and has three Delta™ cathode positions, one of which can be replaced with an in-process heater fixture. The Perkin-Elmer 4450 Sputter Deposition System is designed to be flexible and offers a variety of operating and process modes. 

4450

2400-8L

430P

4410

The Perkin-Elmer Model 2400-8SA features a large 211/2” rotating, water cooled annular table with a capacity of sixty-four 2″, thirty 3″, or thirteen 4″ wafers.

Used in conjunction with a cathode shaping aperture, the rotating table permits high uniformity. A 4″ wafer vertical range of the table facilitates coating bulk substrates. As an added feature, up to three 8″ round cathodes may be specified allowing sequential deposition from several targets or alternately, static deposition or heating from any target position.



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